Title:
METHOD FOR PRODUCING PASSIVATION LAYER FORMATION COMPOSITION, SEMICONDUCTOR SUBSTRATE PROVIDED WITH PASSIVATION LAYER, METHOD FOR PRODUCING SAME, SOLAR CELL ELEMENT, METHOD FOR PRODUCING SAME, AND SOLAR CELL
Document Type and Number:
WIPO Patent Application WO/2016/002902
Kind Code:
A1
Abstract:
This method for producing a passivation layer formation composition includes a step for preparing a mixed composition by mixing a liquid medium and the compound represented by general formula (I), and a step for preparing a water-containing composition by mixing water and the mixed composition. General formula (I): M(OR1)m (in general formula (I): M represents at least one component selected from the group consisting of Al, Nb, Ta, VO, Y, and Hf; R1 each represents an alkyl group or an aryl group; and m represents an integer from 1 to 5).
Inventors:
TANAKA TOORU (JP)
YOSHIDA MASATO (JP)
NOJIRI TAKESHI (JP)
KURATA YASUSHI (JP)
MORISHITA MASATOSHI (JP)
KODAMA SHUNSUKE (JP)
HAYASAKA TSUYOSHI (JP)
YOSHIDA MASATO (JP)
NOJIRI TAKESHI (JP)
KURATA YASUSHI (JP)
MORISHITA MASATOSHI (JP)
KODAMA SHUNSUKE (JP)
HAYASAKA TSUYOSHI (JP)
Application Number:
PCT/JP2015/069193
Publication Date:
January 07, 2016
Filing Date:
July 02, 2015
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD (JP)
International Classes:
H01L31/0216; H01L21/316
Domestic Patent References:
| WO2014014115A1 | 2014-01-23 | |||
| WO2014014110A1 | 2014-01-23 |
Attorney, Agent or Firm:
Taiyo, Nakajima & Kato (JP)
Patent business corporation solar international patent firm (JP)
Patent business corporation solar international patent firm (JP)
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