Title:
METHOD FOR PRODUCING QUARTZ GLASS
Document Type and Number:
WIPO Patent Application WO/2021/112113
Kind Code:
A1
Abstract:
The present invention provides a method for producing quartz glass which has unevenness on the glass surface by surface treating quartz glass using a surface treatment liquid, the production method comprising steps for contacting, with the surface of quartz glass in advance, a solvent component which does not interfere with the surface treatment by the surface treatment liquid, and then surface treating the surface with the surface treatment liquid before the solvent component dries to form uneveness having a surface roughness (Ra) of 1.5 to 3.5 μm on the glass surface. This production method is capable of producing quartz glass that has unevenness having a surface roughness (Ra) within the range of 1.5 to 3.5 μm by a process for forming unevenness without microcracks by surface treatment using a surface treatment liquid, the production method being relatively simple and economical without the need to change the concentration of the surface treatment liquid.
Inventors:
SAITOU AKIRA (JP)
FUJITA DAIKI (JP)
MARUKO YOICHIRO (JP)
AITA TSUTOMU (JP)
SEGAWA TORU (JP)
FUJITA DAIKI (JP)
MARUKO YOICHIRO (JP)
AITA TSUTOMU (JP)
SEGAWA TORU (JP)
Application Number:
PCT/JP2020/044809
Publication Date:
June 10, 2021
Filing Date:
December 02, 2020
Export Citation:
Assignee:
SHIN ETSU QUARTZ PROD CO LTD (JP)
YAMAGATA SHIN ETSU QUARTZ PRODUCTS CO LTD (JP)
YAMAGATA SHIN ETSU QUARTZ PRODUCTS CO LTD (JP)
International Classes:
C03C15/00; C23C16/44; H01L21/205
Foreign References:
| JP2017154906A | 2017-09-07 | |||
| JP2013199425A | 2013-10-03 | |||
| JP2001335342A | 2001-12-04 | |||
| JP2005001923A | 2005-01-06 | |||
| JPH07315872A | 1995-12-05 | |||
| JP2008208008A | 2008-09-11 | |||
| JP2009102195A | 2009-05-14 |
Attorney, Agent or Firm:
PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE (JP)
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