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Title:
METHOD FOR PRODUCING SUBSTRATE, COMPOSITION, AND POLYMER
Document Type and Number:
WIPO Patent Application WO/2020/071339
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a method for producing a substrate, by which a substrate having a metal-containing layer on a surface of a metal substrate can be produced simply; a composition; and a polymer. This method for producing a substrate includes a step for coating a composition on a metal substrate and a step for forming a metal-containing layer on at least a part of the coating film formed in the coating step. The method is characterized in that the composition contains a solvent and a polymer having a first terminal structure and a second terminal structure in the same molecule, and each of the first terminal structure and the second terminal structure is selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). In formula (1), A1 is a monovalent group containing a functional group able to chemically bond to a metal atom. In formula (2), L2 is -S-, -NR- or -NA22-. A2 and A22 are monovalent groups containing a functional group able to chemically bond to a metal atom.

Inventors:
KOMATSU HIROYUKI (JP)
TAMADA MIKI (JP)
KUMEGAWA RYO (JP)
SAKAI TATSUYA (JP)
Application Number:
PCT/JP2019/038636
Publication Date:
April 09, 2020
Filing Date:
September 30, 2019
Export Citation:
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Assignee:
JSR CORP (JP)
International Classes:
C23C18/18; B32B15/08; C08F8/00; C08L101/02; H01L21/288
Domestic Patent References:
WO2012046615A12012-04-12
Foreign References:
JP2012144761A2012-08-02
JP2009263703A2009-11-12
JP2008104909A2008-05-08
Attorney, Agent or Firm:
AMANO Kazunori (JP)
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