METHODS AND DEVICES FOR FABRICATING THREE-DIMENSIONAL NANOSCALE STRUCTURES

Title:

METHODS AND DEVICES FOR FABRICATING THREE-DIMENSIONAL NANOSCALE STRUCTURES

Document Type and Number:

WIPO Patent Application WO2005054119

Kind Code:

A3

Abstract:

The present invention provides methods and devices for fabricating 3D structures and patterns of 3D structures on substrate surfaces, including symmetrical and asymmetrical patterns of 3D structures. Methods of the present invention provide a means of fabricating 3D structures having accurately selected physical dimensions, including lateral and vertical dimensions ranging from 10s of nanometers to 1000s of nanometers. In one aspect, methods are provided using a mask element comprising a conformable, elastomeric phase mask capable of establishing conformal contact with a radiation sensitive material undergoing photoprocessing. In another aspect, the temporal and/or spatial coherence of electromagnetic radiation using for photoprocessing is selected to fabricate complex structures having nanoscale features that do not extend entirely through the thickness of the structure fabricated.

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Inventors:

ROGERS JOHN A (US)
JEON SEOKWOO (US)
PARK JANGUNG (US)

Application Number:

PCT/US2004/040192

Publication Date:

October 13, 2005

Filing Date:

December 01, 2004

Export Citation:

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Assignee:

UNIV ILLINOIS (US)
ROGERS JOHN A (US)
JEON SEOKWOO (US)
PARK JANGUNG (US)

International Classes:

B81C99/00; B82B3/00; G03F1/00; G03F1/60; G03F7/00; G03F7/20; B82B; (IPC1-7): G03F7/00; G03F7/20

Domestic Patent References:

WO2002073699A2

2002-09-19

Foreign References:

JPH1126344A	1999-01-29
US20020110766A1	2002-08-15
US20050124712A1	2005-06-09

Other References: