Title:
METHODS FOR FABRICATION OF LOCALIZED MEMBRANES ON SINGLE CRYSTAL SUBSTRATE SURFACES
Document Type and Number:
WIPO Patent Application WO2005067412
Kind Code:
A3
Abstract:
A method is provided for fabricating thin membrane structures in localized surface regions of a single crystal substrate. In the method, ion implantation masks are patterned on the surface of the single crystal substrate with openings that define the localized surface regions. Foreign ions are implanted through the openings into the single crystal substrate to modify the chemical and/or structural properties of subsurface layers at predetermined depths underneath super layers of material. These subsurface layers are removed by selective etching. The removal of the subsurface layers leaves the super layers of material intact as membrane structures on top of openings or channels corresponding to the space of the removed subsurface layers. At least one portion or end of a membrane structure remains attached to the single crystal substrate.
Inventors:
IZUHARA TOMOYUKI (US)
OSGOOD RICHARD M JR (US)
OSGOOD RICHARD M JR (US)
Application Number:
PCT/US2003/040392
Publication Date:
September 14, 2006
Filing Date:
December 17, 2003
Export Citation:
Assignee:
UNIV COLUMBIA (US)
IZUHARA TOMOYUKI (US)
OSGOOD RICHARD M JR (US)
IZUHARA TOMOYUKI (US)
OSGOOD RICHARD M JR (US)
International Classes:
H01L21/265; H01L21/00; H01L21/20; H01L21/311; H01L21/46
Foreign References:
| US20040091225A1 | 2004-05-13 | |||
| US6544431B2 | 2003-04-08 | |||
| US6540827B1 | 2003-04-01 |
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