Title:
METHODS FOR MAKING FLOW CELL SURFACES
Document Type and Number:
WIPO Patent Application WO/2023/180161
Kind Code:
A3
Abstract:
In an example method, an initial depression is defined in a first resin layer of a multi-layer stack including the first resin layer over a second resin layer or a base support. The first resin layer is resistant to silanization in an organic solvent, the second resin layer or the base support is reactive toward silanization in the organic solvent, and the first resin layer and the second resin layer or the base support are orthogonally etchable. A remaining portion of the first resin layer at the initial depression is anisotropically etched, using air or O2 plasma, through to expose a surface of the second resin layer or the base support and to form a depression. The multi-layer stack is exposed to a silane in the organic solvent to selectively silanizing the surface of the second resin layer or the base support at the depression.
Inventors:
SZEMJONOV ALEXANDRA (GB)
EDGE PHILLIPPA (GB)
RICHEZ ALEXANDRE (GB)
EDGE PHILLIPPA (GB)
RICHEZ ALEXANDRE (GB)
Application Number:
PCT/EP2023/056729
Publication Date:
November 02, 2023
Filing Date:
March 16, 2023
Export Citation:
Assignee:
ILLUMINA CAMBRIDGE LTD (GB)
International Classes:
G03F7/00; B01L3/00
Foreign References:
| US20200238276A1 | 2020-07-30 | |||
| US20210190675A1 | 2021-06-24 | |||
| US20180085752A1 | 2018-03-29 | |||
| US20180327832A1 | 2018-11-15 | |||
| US5571568A | 1996-11-05 | |||
| US20210024991A1 | 2021-01-28 | |||
| US5882792A | 1999-03-16 |
Attorney, Agent or Firm:
FORRESTERS IP LLP (DE)
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