Title:
MONITORING SYSTEM, MONITORING METHOD, AND PROGRAM
Document Type and Number:
WIPO Patent Application WO/2024/024431
Kind Code:
A1
Abstract:
Provided is a monitoring system that is capable of determining, with high precision and high reliability, events that occur in a monitored object. The monitoring system comprises a data acquisition unit that acquires a measured value that is measured by a sensor that is provided to the monitored object, an indicator calculation unit that calculates an abnormality degree indicator on the basis of the measured value and a predetermined unit space, and a first determination unit that determines that an abnormality is occurring in the monitored object when a state in which the abnormality degree indicator is equal to or more than a predetermined first threshold value continues in a continuous or intermittent manner for a predetermined first time period or longer.
Inventors:
NISHIKAWA NAOKI (JP)
KUROIWA TORU (JP)
KUROIWA TORU (JP)
Application Number:
PCT/JP2023/024947
Publication Date:
February 01, 2024
Filing Date:
July 05, 2023
Export Citation:
Assignee:
MITSUBISHI HEAVY IND THERMAL SYSTEMS LTD (JP)
International Classes:
G05B23/02
Foreign References:
| JP2016080286A | 2016-05-16 | |||
| JP2021176088A | 2021-11-04 |
Attorney, Agent or Firm:
MATSUNUMA Yasushi et al. (JP)
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