Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
MONODISPERSE CHLOROMETHYLSTYRENE POLYMER AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2010/131628
Kind Code:
A1
Abstract:
Provided is a monodisperse polymer of a bifunctional compound chloromethylstyrene. Chloromethylstyrene is distilled to a purity of at least 99% and polymerized, preferably using a RAFT reagent.

Inventors:
KAMBARA RIINA (JP)
MORI HIDEHARU (JP)
ENDO TAKESHI (JP)
YONEMORI SHIGEAKI (JP)
Application Number:
PCT/JP2010/057901
Publication Date:
November 18, 2010
Filing Date:
May 10, 2010
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
AGC SEIMI CHEMICAL CO LTD (JP)
KAMBARA RIINA (JP)
MORI HIDEHARU (JP)
ENDO TAKESHI (JP)
YONEMORI SHIGEAKI (JP)
International Classes:
C08F12/18; C08F2/38
Foreign References:
JPH11158242A1999-06-15
JPH08259615A1996-10-08
JP2002332302A2002-11-22
JP2005036240A2005-02-10
JP2003231706A2003-08-19
Other References:
KAMIGAITO M. ET AL.: "Controlled Cationic Polymerization of p- (Chloromethyl) styrene: BF3-Catalyzed Selective Activaion of a C-O Terminal from Alcohol", MACROMOLECULES, vol. 36, no. 10, 26 April 2003 (2003-04-26), pages 3540 - 3544
Attorney, Agent or Firm:
WATANABE Mochitoshi et al. (JP)
Mochitoshi Watanabe (JP)
Download PDF:
Claims: