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Patent Searching and Data


Title:
MULTI-CHARGED PARTICLE BEAM DRAWING DEVICE AND MULTI-CHARGED PARTICLE BEAM DRAWING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/234178
Kind Code:
A1
Abstract:
A multi-charged particle beam drawing device of one embodiment of the present invention is characterized by comprising: a beamforming mechanism for forming multi-charged particle beams; a defect correction data creation circuit for using a dose distribution in which respective locations of unit regions on a sample plane corresponding to an irradiation region with the multi-charged particle beams overall are defined by a uniform dose quantity, regardless of a drawing pattern to be drawn, to create defect correction data defining a dose modulation ratio for correcting the dose quantity of a location that is to be handled by a defective beam that is always beam OFF, among the multi-charged particle beams, by allocating same to one or more other pixels; a storage device for storing the defect correction data; a dose quantity computation circuit for computing, for each drawing pattern, an individual dose quantity for each of the locations on the sample corresponding to the relevant drawing pattern; a dose correction circuit for reading out the defect correction data from the storage device for each of the drawing patterns and correcting the individual dose quantities of the locations on the sample corresponding to the relevant drawing pattern by using a dose allocation using values found by multiplying the dose modulation ratio defined for the defect correction data that was read out by the individual dose quantities of the locations on the sample, thus obtaining corrected dose quantities; and a drawing mechanism for using the multi-charged particle beams, emitted in the corrected dose quantities, to draw the drawing pattern onto the sample.

Inventors:
KATO YASUO (JP)
KAWANA RYOH (JP)
Application Number:
PCT/JP2023/019566
Publication Date:
December 07, 2023
Filing Date:
May 25, 2023
Export Citation:
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Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
H01J37/147; H01J37/30; H01J37/302; H01J37/305; H01L21/027
Foreign References:
JP2019033117A2019-02-28
JP2021197425A2021-12-27
JP2019212869A2019-12-12
Attorney, Agent or Firm:
IKEGAMI, Tetsuma et al. (JP)
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