Title:
NOVEL COMPOUND, PROCESS FOR PRODUCING THE SAME, AND USE THEREOF AS SUPPORT FOR SOLID-PHASE REACTION
Document Type and Number:
WIPO Patent Application WO/2002/070567
Kind Code:
A1
Abstract:
A novel compound useful as a support capable of being used for solid-phase reactions under acidic conditions and under such conditions that sulfoxide groups are reduced. The compound is, for example, 4-hydroxymethyl-3-nitrophenoxyethylpolystyrene.
Inventors:
HANDA HIROSHI (JP)
TAKAHASHI TAKASHI (JP)
OHNO HIROSHI (JP)
KAWAMURA KUNIAKI (JP)
OHTAKE ATSUSHI (JP)
TAKAHASHI TAKASHI (JP)
OHNO HIROSHI (JP)
KAWAMURA KUNIAKI (JP)
OHTAKE ATSUSHI (JP)
Application Number:
PCT/JP2002/002108
Publication Date:
September 12, 2002
Filing Date:
March 07, 2002
Export Citation:
Assignee:
JAPAN REPRESENTED BY PRESIDENT (JP)
TORAY INDUSTRIES (JP)
HANDA HIROSHI (JP)
TAKAHASHI TAKASHI (JP)
OHNO HIROSHI (JP)
KAWAMURA KUNIAKI (JP)
OHTAKE ATSUSHI (JP)
TORAY INDUSTRIES (JP)
HANDA HIROSHI (JP)
TAKAHASHI TAKASHI (JP)
OHNO HIROSHI (JP)
KAWAMURA KUNIAKI (JP)
OHTAKE ATSUSHI (JP)
International Classes:
C07C205/37; C07D489/02; C07D491/16; C08F8/00; (IPC1-7): C08F8/00; C07C39/27; C07C47/55; C07C205/19; C07C205/44; C07D489/02; C07D491/16; C08G81/02; C08G85/00
Domestic Patent References:
| WO1999039207A1 | 1999-08-05 |
Foreign References:
| EP0292729A2 | 1988-11-30 |
Attorney, Agent or Firm:
Tanigawa, Hidejiro c/o TANIGAWA AND ASSOCIATES (Patent Firm 6F Iwata Bldg., 5-1, Iidabashi 4-chome Chiyoda-ku Tokyo, JP)
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