Title:
OVERLAY MARK FOR FORMING MOIRE PATTERN, OVERLAY MEASUREMENT METHOD USING SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/140468
Kind Code:
A1
Abstract:
The present invention relates to an image-based overlay measurement overlay mark for determining relative mismatch between two or more pattern layers and comprises first to fourth overlay marks. The first overlay mark forms a pair of first moire patterns, which include a first center of symmetry (COS1), have a rotational symmetry of 180 degrees with respect to the first center of symmetry (COS1), have central axes that match, and are arranged at the center part of the overlay mark, the second overlay mark forms a pair of second moire patterns, which include a second center of symmetry (COS2), have a rotational symmetry of 180 degrees with respect to the second center of symmetry (COS2), have central axes that match, and are arranged to face each other with the first moire patterns therebetween, the third overlay mark forms a pair of third moire patterns, which include a third center of symmetry (COS3), have a rotational symmetry of 180 degrees with respect to the third center of symmetry (COS3), and are arranged on a first diagonal line with the first moire patterns therebetween, and the fourth overlay mark forms a pair of fourth moire patterns, which include a fourth center of symmetry (COS4), have a rotational symmetry of 180 degrees with respect to the fourth center of symmetry (COS4), and are arranged on a second diagonal line, intersecting with the first diagonal line, with the first moire patterns therebetween.
Inventors:
LEE HYUN CHUL (KR)
CHANG HYUN JIN (KR)
HONG SUNG HOON (KR)
WOO YOUNG JE (KR)
CHANG HYUN JIN (KR)
HONG SUNG HOON (KR)
WOO YOUNG JE (KR)
Application Number:
PCT/KR2022/016026
Publication Date:
July 27, 2023
Filing Date:
October 20, 2022
Export Citation:
Assignee:
AUROS TECH INC (KR)
International Classes:
G03F7/20
Foreign References:
| KR20140096331A | 2014-08-05 | |||
| KR100225230B1 | 1999-10-15 | |||
| JP2020112807A | 2020-07-27 | |||
| KR20150013428A | 2015-02-05 | |||
| KR101906098B1 | 2018-10-10 |
Attorney, Agent or Firm:
DYNE PATENT & LAW FIRM (KR)
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