Title:
OXIDE SINTERED COMPACT, METHOD FOR PRODUCING SAME, AND SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2016/017589
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide an oxide sintered compact to be used in a sputtering target in which little abnormal discharge occurs even during high-power deposition and no cracking occurs in the target. An oxide sintered compact having zinc, aluminum, titanium, and oxygen as constituent elements, wherein the oxide sintered compact is characterized in that the atomic ratio of elements constituting the sintered compact is Al/(Zn + Al + Ti)=0.035-0.050 Ti/(Zn+Al+Ti) = 0.05-0.20, where Zn, Al, and Ti respectively indicate the zinc, aluminum, and titanium content, and the average grain diameter of crystal grains having a Zn2TiO4 crystalline phase as a matrix is 5 μm or less.
More Like This:
Inventors:
OMI KENJI (JP)
ITOH KENICHI (JP)
UTSUMI KENTAROU (JP)
ITOH KENICHI (JP)
UTSUMI KENTAROU (JP)
Application Number:
PCT/JP2015/071261
Publication Date:
February 04, 2016
Filing Date:
July 27, 2015
Export Citation:
Assignee:
TOSOH CORP (JP)
International Classes:
C04B35/453; C23C14/34
Domestic Patent References:
| WO2008013237A1 | 2008-01-31 |
Foreign References:
| JP2011093717A | 2011-05-12 | |||
| JP2009298649A | 2009-12-24 | |||
| JP2013209741A | 2013-10-10 | |||
| JP2006505482A | 2006-02-16 |
Download PDF: