Title:
PARTICLE BEAM RADIATION SYSTEM AND PARTICLE BEAM RADIATION METHOD
Document Type and Number:
WIPO Patent Application WO/2011/058833
Kind Code:
A1
Abstract:
Provided is a particle beam radiation system in a particle beam treatment apparatus, the particle beam radiation system being capable of high-speed scanning with a particle beam even in a case where the apparatus has a large radiation field. The particle beam radiation system is provided with: a first deflection device (21), wherein the largest amount of deflection provided thereby makes it possible to move a particle beam (1) to the points corresponding to the maximum width of a target in one direction; and a second deflection device (22) which deflects the particle beam (1) in the one direction, wherein the largest amount of deflection provided thereby is smaller than the largest amount of deflection provided by the first deflection device (21). The particle beam radiation system is configured in such a manner that when moving the particle beam, control is carried out in such a manner that the amount of deflection provided by the second deflection device (22) is increased, thereby moving the particle beam (1). Further, the particle beam radiation system is configured to, when the particle beam (1) is made stationary, perform deflection replacement control in which, by changing the amount of deflection provided by the first deflection device (21) while decreasing the amount of deflection provided by the second deflection device (22), deflection provided by the second deflection device (22) is gradually replaced with deflection provided by the first deflection device (21), so that the position of the particle beam (1) on a target can be made stationary.
Inventors:
PU YUEHU (JP)
Application Number:
PCT/JP2010/067216
Publication Date:
May 19, 2011
Filing Date:
October 01, 2010
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP (JP)
PU YUEHU (JP)
PU YUEHU (JP)
International Classes:
G21K5/04; A61N5/10
Domestic Patent References:
| WO2009035080A1 | 2009-03-19 |
Foreign References:
| JP2009066106A | 2009-04-02 | |||
| JPH03119641A | 1991-05-22 |
Attorney, Agent or Firm:
OIWA Masuo et al. (JP)
Masuo Oiwa (JP)
Masuo Oiwa (JP)
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