PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD

WIPO Patent Application WO/2007/111087

A1

At the time of transferring a pattern of toner particles (55) from a recess (14a) of an original plate (1) to a glass plate (5), the thickness of the toner particles (55) to be applied in the recess (14a) in a development process is controlled so as to excellently remove the toner particles (55) from the recess (14a) and transfer them on the glass plate (5). As a thickness (t2) of the toner particle layer to be applied in the recess (14a), a value up to that slightly larger than a distance (T) from the bottom of the recess (14a) to the glass plate (5) is allowed.

TAKAHASHI KEN (JP)
ISHII KOICHI (JP)
TAJIMA YOSHIHIRO (JP)
SAITO MITSUNAGA (JP)
HOSOYA MASAHIRO (JP)
HIRAHARA SACHIKO (JP)
KAWAMURA NOBUO (JP)
YAGI HITOSHI (JP)
NAKAO HIDEYUKI (JP)

PCT/JP2007/054240

October 04, 2007

March 06, 2007

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TOSHIBA KK (JP)
TAKAHASHI KEN (JP)
ISHII KOICHI (JP)
TAJIMA YOSHIHIRO (JP)
SAITO MITSUNAGA (JP)
HOSOYA MASAHIRO (JP)
HIRAHARA SACHIKO (JP)
KAWAMURA NOBUO (JP)
YAGI HITOSHI (JP)
NAKAO HIDEYUKI (JP)

G03G15/22; B05D1/06; B41M1/10; B41M1/42; G02B5/20; G03G15/10; G03G15/16; H01J9/227

JPS4512931B1	1970-05-11
JPH049902A	1992-01-14
JPH05142414A	1993-06-11
JP2002331259A	2002-11-19
JP2004286871A	2004-10-14
JP2001125392A	2001-05-11
JP2000221752A	2000-08-11
JP2004334017A	2004-11-25
JPH02272585A	1990-11-07
JPH02158777A	1990-06-19

SUZUYE, Takehiko et al. (1-12-9 Toranomon,,Minato-ku, Tokyo01, JP)

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