Title:
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/035497
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a pattern forming method which is capable of achieving all of LWR performance, suppression of development defects and pattern shape at extremely high levels, especially for the formation of an ultra-thin pattern (for example, one having a line width of 50 nm or less).
A pattern forming method which comprises:
(1) a step for forming a film from an active light sensitive or radiation sensitive resin composition containing the following components (A)-(C),
(A) a resin which has a repeating unit containing a phenolic hydroxyl group, while having a group that generates a polar group by being decomposed by the action of an acid,
(B) a compound which generates an acid by being irradiated with active light or radiation, and
(C) a compound which has a cationic moiety and an anionic moiety in a same molecule, and wherein the cationic moiety and the anionic moiety are linked by a covalent bond;
(2) a step for exposing the film to light; and
(3) a step for forming a negative pattern by developing the exposed film with use of a developer liquid that contains an organic solvent. A method for manufacturing an electronic device, which uses this pattern forming method; and an electronic device which is manufactured by this manufacturing method.
Inventors:
NIHASHI WATARU (JP)
Application Number:
PCT/JP2015/072142
Publication Date:
March 10, 2016
Filing Date:
August 04, 2015
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; C08F220/18; C08F220/28; G03F7/038; G03F7/039
Domestic Patent References:
| WO2014122852A1 | 2014-08-14 |
Foreign References:
| JP2013076991A | 2013-04-25 | |||
| JP2013205520A | 2013-10-07 | |||
| JP2013167826A | 2013-08-29 | |||
| JP2011118419A | 2011-06-16 | |||
| JP2013064986A | 2013-04-11 | |||
| JP2002365802A | 2002-12-18 | |||
| JP2004347738A | 2004-12-09 |
Attorney, Agent or Firm:
TAKAMATSU Takeshi et al. (JP)
Takamatsu 猛 (JP)
Takamatsu 猛 (JP)
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