PATTERN FORMING METHOD

WIPO Patent Application WO/2007/007513

A1

A pattern forming method for highly accurately and efficiently forming a permanent pattern such as a wiring pattern by improving exposure performance without causing cost increase of an apparatus nor exposure speed deterioration. The pattern forming method includes at least exposure wherein light from a light irradiation means is modulated to a photosensitive layer by a light modulating means which receives the light from the light irradiation means and modulates the light based on pattern information, and that the light modulated by the light modulating means is permitted to form an image on a plane of the photosensitive layer to be exposed through an imaging means and a focal point adjusting means. In the exposure, the light modulated by the light modulating means is permitted to form the image only in a substantially rectangular region including a center portion of the imaging means, and a short side direction of the substantially rectangular shape is directed toward the swell direction of the photosensitive layer.

TAKASHIMA MASANOBU (JP)
OKAZAKI YOJI (JP)
ISHIKAWA HIROMI (JP)

PCT/JP2006/312115

January 18, 2007

June 16, 2006

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FUJIFILM CORP (JP)
TAKASHIMA MASANOBU (JP)
OKAZAKI YOJI (JP)
ISHIKAWA HIROMI (JP)

G03F7/20; G03F7/033

JP2004335692A	2004-11-25
JP2005032909A	2005-02-03
JP2001036088A	2001-02-09
JP2004342633A	2004-12-02

HIROTA, Koichi et al. (NAGARE & ASSOCIATES 4th Floor, Shinjuku TR Bldg., 2-2-13, Yoyog, Shibuya-ku Tokyo 53, JP)

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