Title:
PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2013/132979
Kind Code:
A1
Abstract:
A pattern forming method for forming a fine pattern, said pattern forming method comprising: a first step for changing into a lyophilic nature a first pattern formation region, wherein a first pattern is to be formed, in a liquid-repellent first film having a lyophilic-lyophobic conversion function, said liquid-repellent first film being formed on a substrate, to reduce the film thickness; a second step for forming a second film having a flat surface on the first film; and a third step for drying the second film and thus forming the first pattern in the first pattern formation region.
More Like This:
Inventors:
MIYAMOTO KIMIAKI (JP)
Application Number:
PCT/JP2013/053398
Publication Date:
September 12, 2013
Filing Date:
February 13, 2013
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L21/288; H01L21/3205; H01L21/336; H01L21/768; H01L29/786
Foreign References:
| JP2009026900A | 2009-02-05 | |||
| JP2009026899A | 2009-02-05 | |||
| JP2009026901A | 2009-02-05 | |||
| JP2796575B2 | 1998-09-10 | |||
| JP2002162630A | 2002-06-07 | |||
| JP2003096034A | 2003-04-03 | |||
| JP2003267982A | 2003-09-25 | |||
| JPH11193345A | 1999-07-21 | |||
| JPH11193346A | 1999-07-21 | |||
| JPH11193347A | 1999-07-21 |
Other References:
D. K. OWENS; R. C. WENDT, JOURNAL OF APPLIED POLYMER SCIENCE, vol. 13, 1969, pages 1741
See also references of EP 2824695A4
See also references of EP 2824695A4
Attorney, Agent or Firm:
WATANABE Mochitoshi et al. (JP)
Mochitoshi Watanabe (JP)
Mochitoshi Watanabe (JP)
Download PDF:
Claims: