PATTERNED THIN FILM GRAPHITE DEVICES AND METHOD FOR MAKING SAME

Title:

PATTERNED THIN FILM GRAPHITE DEVICES AND METHOD FOR MAKING SAME

Document Type and Number:

WIPO Patent Application WO2005001895

Kind Code:

A3

Abstract:

In a method of making graphite devices (100), a preselected crystal face (12) of a crystal (10) is annealed to create a thin-film graphitic layer (30) disposed against selected face (12). A preselected pattern is generated on the thin-film graphitic layer (30). A functional structure (320) includes a crystalline substrate (10) having a preselected crystal face (12). A thin-film graphitic layer (30) is disposed on the preselected crystal face (12). The thin-film graphitic layer (30) is patterned so as to define at least one functional structure (320).

Inventors:

DEHEER WALT (US)
BERGER CLAIRE (US)
FIRST PHILLIP (US)

Application Number:

PCT/US2004/017537

Publication Date:

January 19, 2006

Filing Date:

June 03, 2004

Export Citation:

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Assignee:

GEORGIA TECHNOLOGY RES CORP (US)

International Classes:

B32B9/00; H01L21/04; H01L21/302; H01L21/461; H01L29/16; H01L29/772; H01L; (IPC1-7): C23C14/00; H01L29/06; H01L29/76; H01L29/94; H01L31/062

Foreign References:

US6136160A	2000-10-24
US6159558A	2000-12-12
US6515339B2	2003-02-04

Other References: