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Patent Searching and Data


Title:
PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE AND PELLICLE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2023/038139
Kind Code:
A1
Abstract:
This pellicle is provided with a pellicle frame, a pellicle film which is supported on one end surface of the pellicle frame, and an adhesive layer which is provided on the other end surface of the pellicle frame, and satisfies formula (1). Formula (1): [A60°C] ≥ 4.0 gf/mm2 In formula (1), [A60°C] indicates a first release strength when the pellicle is on a test laminate. The test laminate is obtained by placing the pellicle on a quartz glass substrate such that the adhesive layer is in contact with the surface of the quartz glass substrate, and by maintaining a load on the pellicle under prescribed conditions. The first release strength indicates the load per unit adhesive area required to release the pellicle included in the test laminate from the quartz glass substrate obtained using a standard universal testing machine under prescribed conditions.

Inventors:
UNEZAKI TAKASHI (JP)
HARUTA KAICHIRO (JP)
SATOH YASUSHI (JP)
ITO KEN (JP)
ONO YOSUKE (JP)
FUJIMURA MASASHI (JP)
ISHIKAWA HISAKO (JP)
Application Number:
PCT/JP2022/034108
Publication Date:
March 16, 2023
Filing Date:
September 12, 2022
Export Citation:
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Assignee:
MITSUI CHEMICALS INC (JP)
International Classes:
G03F1/62; G03F7/20
Foreign References:
JP2018021182A2018-02-08
JP2015114502A2015-06-22
KR20200014066A2020-02-10
JP2016156882A2016-09-01
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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