PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING PELLICLE

WIPO Patent Application WO/2023/038142

A1

This pellicle is provided with a pellicle frame, a pellicle film, and an adhesive layer. An inner wall surface and/or an outer wall surface of the adhesive layer satisfies expression (1).　Expression (1): ([A2s]/[A50s]) ≤ 0.97 where A2s indicates the normalized strength of a partial structure included in a main agent component of the adhesive layer obtained by analyzing a first deep part having a first depth from the surface of the adhesive layer by time-of-flight secondary ion mass spectrometry. The first depth is formed by irradiating an area 600 μm square on the surface with a sputter ion gun that is an argon gas cluster ion beam for two seconds in total. A50s indicates the normalized strength of a partial structure included in a main agent component of the adhesive layer obtained by analyzing a second deep part having a second depth by time-of-flight secondary ion mass spectrometry. The second depth is formed by irradiating the area with the sputter ion gun for 50 seconds in total.

TANAKA HIROFUMI (JP)
ONO YOSUKE (JP)
ISHIKAWA AKIRA (JP)
SATOH YASUSHI (JP)
ISHIKAWA HISAKO (JP)
FUJIMURA MASASHI (JP)
OKUBO ATSUSHI (JP)
KOHMURA KAZUO (JP)

PCT/JP2022/034111

March 16, 2023

September 12, 2022

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MITSUI CHEMICALS INC (JP)

G03F1/62; G03F7/20

WO2020196836A1	2020-10-01
WO2019172141A1	2019-09-12
WO2018151056A1	2018-08-23

TAIYO, NAKAJIMA & KATO (JP)

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