Title:
PELLICLE FRAME, PELLICLE, PELLICLE PRODUCTION METHOD AND PELLICLE FRAME EVALUATION METHOD
Document Type and Number:
WIPO Patent Application WO/2023/038141
Kind Code:
A1
Abstract:
This pellicle frame has one end surface provided with an adhesive layer capable of adhering to a photomask, and another end surface for supporting a pellicle film. The pellicle frame is a rectangular pellicle frame (but is not a pellicle frame which contains quartz glass). The amount Δd of twisting at the one end surface is no more than 10μm. The amount Δd of twisting at the one end surface is the maximum value of the distance between a virtual plane passing through three of four points located at the four corners of the one end surface and the remaining one point thereof.
Inventors:
FUJIMURA MASASHI (JP)
ISHIKAWA AKIRA (JP)
ISHIKAWA HISAKO (JP)
OKUBO ATSUSHI (JP)
ISHIKAWA AKIRA (JP)
ISHIKAWA HISAKO (JP)
OKUBO ATSUSHI (JP)
Application Number:
PCT/JP2022/034110
Publication Date:
March 16, 2023
Filing Date:
September 12, 2022
Export Citation:
Assignee:
MITSUI CHEMICALS INC (JP)
International Classes:
G03F1/64
Foreign References:
| JP2015001683A | 2015-01-05 | |||
| JP2009025559A | 2009-02-05 | |||
| JP2011076042A | 2011-04-14 | |||
| JP2011095556A | 2011-05-12 | |||
| JP2016062055A | 2016-04-25 |
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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