PHOTO-ALIGNMENT EXPOSURE DEVICE AND PHOTO-ALIGNMENT EXPOSURE METHOD

WIPO Patent Application WO/2020/162026

A1

The present invention addresses the problem of enabling a photo-alignment exposure device, for implementing an oblique exposure method capable of causing a pre-tilt angle to stably appear, to use an inexpensive scattering light source (volume light source) and to realize uniform light irradiation even with a compact configuration. A photo-alignment exposure device (1) according to the present invention is for performing polarized scan exposure on a to-be-irradiated surface which becomes a photo-alignment film, and is provided with: a light source (2) for emitting scattering light toward the to-be-irradiated surface; an optical filter (3) through which the photosensitive wavelength of the photo-alignment film in the light emitted from the light source (2) is selectively emitted; and a light limitation member (4) that asymmetrically limits the light having passed through the optical filter (3) in the back-and-forth direction of a scanning direction (X), wherein the optical filter (3) has wavelength transmission characteristics where the transmittance of light having the photosensitive wavelength reaches a peak through oblique exposure where an irradiation angle in the scanning direction (X) is equal to or more than a set angle (θs) with respect to the normal direction of the surface being irradiated.

YOSHIDA YUJI (JP)
IKEDA SATOSHI (JP)
ARAI TOSHINARI (JP)
KATAYAMA TAKASHI (JP)
HANAOKA KAZUTAKA (JP)

PCT/JP2019/047893

August 13, 2020

December 06, 2019

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V TECH CO LTD (JP)
SHARP KK (JP)

G02F1/1337

WO2018008485A1	2018-01-11
WO2019031453A1	2019-02-14

JP2004144884A	2004-05-20
JP2008116674A	2008-05-22
US20120194753A1	2012-08-02

EICHI PATENT & TRADEMARK CORP. (JP)

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