Title:
PHOTO- AND ELECTRON RESIST
Document Type and Number:
WIPO Patent Application WO/1983/002339
Kind Code:
A1
Abstract:
The photo- and electron resist contains a light-sensitive compound, a film-forming compound, a sensitizer, an organic solvent, an additive which forms a donor-acceptor complex with said compounds and reaction products thereof, which complex quenches the luminescence and improves the stability of the resist. The photo- and electron resist finds application in microelectronics, optics, printing arts, precise mechanical engineering, where structures of semiconductor devices and solid-state circuit are fabricated through the use of the resists.
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| JPS5260613 | PHOTOSENSITIVE RESIN COMPOSITION |
Inventors:
MOLODNYAKOV SERGEY PETROVICH (SU)
FEDOROV YURY IVANOVICH (SU)
KUZNETSOV VITALY ALEKSEEVICH (SU)
EGOROCHKIN ALEKSEY NIKOLAEVICH (SU)
BIRYUKOVA TAMARA GRIGOREVNA (SU)
RAZUVAEV GRIGORY ALEKSEEVICH (SU)
FEDOROV YURY IVANOVICH (SU)
KUZNETSOV VITALY ALEKSEEVICH (SU)
EGOROCHKIN ALEKSEY NIKOLAEVICH (SU)
BIRYUKOVA TAMARA GRIGOREVNA (SU)
RAZUVAEV GRIGORY ALEKSEEVICH (SU)
Application Number:
PCT/SU1981/000078
Publication Date:
July 07, 1983
Filing Date:
December 21, 1981
Export Citation:
Assignee:
INST CHIMII AKADEMII NAUK SSSR (SU)
International Classes:
G03F7/038; G03C1/72; G03F7/09; H01L21/30; (IPC1-7): G03C1/68
Foreign References:
| GB1474817A | 1977-05-25 | |||
| GB1481909A | 1977-08-03 | |||
| GB1602724A | 1981-11-18 | |||
| US3977874A | 1976-08-31 |
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