Title:
PHOTO-POST-CURING RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2015/029689
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a photo-post-curing resin composition that makes it possible to suppress the generation of outgas and has exceptional transparency and reliability. The present invention is a photo-post-curing resin composition containing a cationically curable resin, a photo-cationic polymerization initiator, and a compound having amino groups and cationically polymerizable functional groups.
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Inventors:
WATANABE YASUO (JP)
SHICHIRI TOKUSHIGE (JP)
SHICHIRI TOKUSHIGE (JP)
Application Number:
PCT/JP2014/070189
Publication Date:
March 05, 2015
Filing Date:
July 31, 2014
Export Citation:
Assignee:
SEKISUI CHEMICAL CO LTD (JP)
International Classes:
C08G59/20; C08G59/68; C08L63/00
Foreign References:
JP2006135128A | 2006-05-25 | |||
JPH07238148A | 1995-09-12 | |||
JP2005241977A | 2005-09-08 |
Attorney, Agent or Firm:
YASUTOMI & Associates (JP)
Patent business corporation Yasutomi international patent firm (JP)
Patent business corporation Yasutomi international patent firm (JP)
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