PHOTOCATALYTIC SUBSTRATE ACTIVE UNDER A VISIBLE LIGHT

WIPO Patent Application WO2005102952

A3

The invention relates to a substrate provided with a mechanically resistant, long-lasting coating, and suitable for being handled by a user. Said substrate is characterised in that the coating comprises a first photocatalytic compound which is intimately associated with a second compound containing an energy jump between the upper level of the valence band thereof and the lower level of the conductive band thereof, corresponding to a wavelength in the visible field. The invention also relates to a glazing comprising said substrate, to the applications of the inventive substrate, and to the methods for the production thereof.

KHARCHENKO ANDRIY (FR)
LABROUSSE LAURENT (FR)
GUENEAU LAETICIA (FR)

PCT/FR2005/050229

August 24, 2006

April 12, 2005

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SAINT GOBAIN (FR)
KHARCHENKO ANDRIY (FR)
LABROUSSE LAURENT (FR)
GUENEAU LAETICIA (FR)

C03C17/00; B05D5/08; C03C8/12; C03C17/22; C04B41/52; C09K3/18; C23C14/00; C23C16/00; C23C30/00; H01J1/62

WO2001068786A1	2001-09-20
WO2002092879A1	2002-11-21

US20030232186A1	2003-12-18
EP1398146A1	2004-03-17
EP0590477A1	1994-04-06
EP1066878A1	2001-01-10
FR2738836A1	1997-03-21
EP0816466A1	1998-01-07
EP0869156A1	1998-10-07

PATENT ABSTRACTS OF JAPAN vol. 1998, no. 13 30 November 1998 (1998-11-30)
MIYAUCHI M ET AL: "A HIGHLY HYDROPHILIC THIN FILM UNDER 1 MUMW/CM2 UV ILLUMINATION", ADVANCED MATERIALS, WILEY VCH, WEINHEIM, DE, vol. 12, no. 24, 15 December 2000 (2000-12-15), pages 1923 - 1927, XP000977834, ISSN: 0935-9648

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