PHOTOCURABLE COMPOSITION FOR PATTERN FORMATION, AND METHOD FOR MEASURING FILM THICKNESS USING SAME

WIPO Patent Application WO/2011/027882

A1

Disclosed is a photocurable composition which can be a transfer-receiving material layer that is used in a pattern formation wherein the transfer-receiving material layer is sandwiched between a substrate and a mold, which is provided with a recessed and projected pattern, so that the recessed and projected pattern is filled with the transfer-receiving material layer, and the mold is released therefrom after molding the transfer-receiving material layer by exposure and curing. The photocurable composition contains, per 100 parts by mass of a photocurable component, 0.0001-10 parts by mass of a fluorescent substance that has an absorption wavelength range, at which the fluorescent substance emits fluorescent light, within the range from the ultraviolet range to the visible light range, and there is substantially no absorption by the materials other than the fluorescent substance in the photocured product obtained by light exposure in at least a part of the absorption wavelength range of the fluorescent substance nor in at least a part of the wavelength range of the fluorescent light emitted by the fluorescent substance.

SAKAI NOBUJI (JP)
HIRASAWA TAMANO (JP)
KOBAYASHI KEI (JP)
NAKAGAWA MASARU (JP)

PCT/JP2010/065220

March 10, 2011

September 06, 2010

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TOYO GOSEI CO LTD (JP)
UNIV TOHOKU (JP)
SAKAI NOBUJI (JP)
HIRASAWA TAMANO (JP)
KOBAYASHI KEI (JP)
NAKAGAWA MASARU (JP)

H01L21/027; G01B11/06

JP2008183731A	2008-08-14
JPS5345180A	1978-04-22
JPS6327830A	1988-02-05
JPS59208724A	1984-11-27
JPH0864509A	1996-03-08
JPS59232344A	1984-12-27
JPH0217625A	1990-01-22

KURIHARA, Hiroyuki et al. (JP)
Hiroyuki Kurihara (JP)

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