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Patent Searching and Data


Title:
PHOTOCURABLE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2011/122025
Kind Code:
A1
Abstract:
The disclosed photocurable resin composition exhibits a good black color while also being highly sensitive. A dry film resulting therefrom feels very dry to the touch. The disclosed photocurable resin composition exhibits minimal outgassing, e.g. during curing. When used, for example, to form a solder resist for a printed circuit board, said photocurable resin composition provides excellent alignment precision, high productivity, and high reliability. The disclosed photocurable resin composition is characterized by containing: a photopolymerization initiator, each molecule of which has two oxime ester groups; a colorant; a carboxyl-containing resin; and a compound, each molecule of which has a plurality of ethylene unsaturated groups.

Inventors:
SHIBASAKI YOKO (JP)
ARIMA MASAO (JP)
Application Number:
PCT/JP2011/001921
Publication Date:
October 06, 2011
Filing Date:
March 30, 2011
Export Citation:
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Assignee:
TAIYO HOLDINGS CO LTD (JP)
SHIBASAKI YOKO (JP)
ARIMA MASAO (JP)
International Classes:
G03F7/031; G03F7/004; H05K3/28
Domestic Patent References:
WO2008138732A12008-11-20
WO2008138733A12008-11-20
WO2011007566A12011-01-20
Foreign References:
JP4344400B12009-10-14
JP2007197390A2007-08-09
JP2008257045A2008-10-23
JP2007197340A2007-08-09
JP2009519991A2009-05-21
JP2005097141A2005-04-14
JP2010256717A2010-11-11
Attorney, Agent or Firm:
AMAGI INTERNATIONAL PATENT LAW OFFICE (JP)
Patent business corporation Amagi international patent firm (JP)
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Claims: