Title:
PHOTOCURABLE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2011/122026
Kind Code:
A1
Abstract:
Disclosed are: a photocurable composition which enables the formation of a highly fine pattern and which enables the formation of a pattern without causing any line defects by undercutting in a bus electrode (4a, 4b) having a white/black two-layered structure; and a bus electrode having a white/black two-layered structure which is produced using the photocurable composition. The photocurable composition is characterized by comprising an inorganic powder, an organic binder, a photopolymerizable monomer, and a photopolymerization initiator which comprises an oxime ester compound having a nitrocarbazole structure and is represented by general formula (I).
Inventors:
USHIYAMA KOUSUKE (JP)
ITO HIDEYUKI (JP)
ITO HIDEYUKI (JP)
Application Number:
PCT/JP2011/001923
Publication Date:
October 06, 2011
Filing Date:
March 30, 2011
Export Citation:
Assignee:
TAIYO HOLDINGS CO LTD (JP)
USHIYAMA KOUSUKE (JP)
ITO HIDEYUKI (JP)
USHIYAMA KOUSUKE (JP)
ITO HIDEYUKI (JP)
International Classes:
H01J9/02; C08F2/50; H01J11/12; H01J11/24
Foreign References:
| JP4223071B2 | 2009-02-12 | |||
| JP2008243687A | 2008-10-09 | |||
| JP2010061041A | 2010-03-18 | |||
| JP2006016545A | 2006-01-19 |
Attorney, Agent or Firm:
AMAGI INTERNATIONAL PATENT LAW OFFICE (JP)
Patent business corporation Amagi international patent firm (JP)
Patent business corporation Amagi international patent firm (JP)
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