Title:
PHOTOMASK AND METHOD FOR PREPARING SAME
Document Type and Number:
WIPO Patent Application WO/2023/015638
Kind Code:
A1
Abstract:
A photomask and a method for preparing same, which are used for avoiding the situation whereby a photomask is discarded and unusable due to a destructive process failure thereof, thereby saving on costs. The photomask comprises: a first substrate (1), which comprises a first surface (3) and a second surface (4) that are opposite each other, a first side surface (5) connecting the first surface (3) and the second surface (4), and an accommodating space (6) that is open at the first side surface (5); and a second substrate (2) arranged in the accommodating space (6), wherein a pixel field (14) is formed in the second substrate (2).
Inventors:
WANG MEI-LI (CN)
Application Number:
PCT/CN2021/116875
Publication Date:
February 16, 2023
Filing Date:
September 07, 2021
Export Citation:
Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
G03F1/36
Foreign References:
| CN109634054A | 2019-04-16 | |||
| KR100658762B1 | 2006-12-15 | |||
| CN111221221A | 2020-06-02 | |||
| CN102131949A | 2011-07-20 | |||
| US20160225995A1 | 2016-08-04 | |||
| US20040044982A1 | 2004-03-04 |
Attorney, Agent or Firm:
TDIP & PARTNERS (CN)
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