Title:
PHOTOMASK STRUCTURE AND COA-TYPE ARRAY SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2018/166027
Kind Code:
A1
Abstract:
A photomask structure and a COA-type array substrate. The photomask structure comprises: a central light-shading part (1); a peripheral light-shading part (3) surrounding the central light-shading part and shaped to conform to the outer profile of the central light-shading part; and an annular hollowed-out slit (5) sandwiched between the peripheral light-shading part and the central light-shading part. When passing through the hollowed-out slit, an exposure light is diffracted to generate a counter-propagating bent and scattered light and a gradual change in energy intensity; and the gradient of via holes of the finally prepared color film can be reduced when a negative photoresistance is cooperatively used, thus improving the electric connection quality between a pixel electrode and a signal line of a metal material and avoiding an undesired displaying effect.
Inventors:
SUN TAO (CN)
Application Number:
PCT/CN2017/080735
Publication Date:
September 20, 2018
Filing Date:
April 17, 2017
Export Citation:
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
G03F7/20; H01L27/12
Foreign References:
| CN104730753A | 2015-06-24 | |||
| CN104656333A | 2015-05-27 | |||
| CN101566790A | 2009-10-28 |
Other References:
See also references of EP 3598234A4
Attorney, Agent or Firm:
COMIPS INTELLECTUAL PROPERTY OFFICE (CN)
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