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Title:
PHOTOPOLYMERIZABLE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/1991/009880
Kind Code:
A1
Abstract:
A photopolymerizable composition comprising at least a photopolymerization initiator and an addition-polymerizable compound, wherein the photopolymerization initiator is composed of at least a sulfide compound, a benzophenone compound, an alkylaminobenzophenone compound, a 2,4,5-triarylimidazolyl dimer, and a triarylmethane leuco dye, and further preferably an alkyl p-(dialkylamino)-benzoate. This composition is used for coating and as a photoresist. In the latter use, the composition contains a thermoplastic polymer, preferably an alkali-soluble polymer including non-styrenic and styrenic polymers.

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Inventors:
TAKENAKA FUMIO (JP)
TOYA KOUJI (JP)
Application Number:
PCT/JP1990/001683
Publication Date:
July 11, 1991
Filing Date:
December 25, 1990
Export Citation:
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Assignee:
DAICEL CHEM (JP)
International Classes:
C08F2/50; G03F7/031; (IPC1-7): C08F2/50; C08F22/14; G03F7/028
Foreign References:
JPS50126088A1975-10-03
JP54025957B
JPS4537377B11970-11-27
Attorney, Agent or Firm:
Kuwata, Mitsuo (Tomita-cho Park Building 6-10, Nishitemma 5-chome, Kita-k, Osaka-shi Osaka 530, JP)
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