Title:
PHOTOSENSITIVE COLORING COMPOSITION FOR INFRARED-LIGHT PASS FILTERS, INFRARED-LIGHT PASS FILTER, METHOD FOR MANUFACTURING PHOTOSENSITIVE COLORING COMPOSITION FOR INFRARED-LIGHT PASS FILTERS, AND METHOD FOR MANUFACTURING INFRARED-LIGHT PASS FILTER
Document Type and Number:
WIPO Patent Application WO/2023/080176
Kind Code:
A1
Abstract:
This photosensitive coloring composition for infrared-light pass filters contains a coloring agent, a polymerizable compound, a photoinitiator, and a polymerization inhibitor. The polymerizable compound includes a first (meth)acrylate having two or more functional groups. At least one of the two or more functional groups is an amino group. The percentage of the mass of the first (meth)acrylate with respect to the mass of the photoinitiator is 50-500%. The percentage of the mass of the polymerization inhibitor with respect to the mass of the photoinitiator is 3-30%.
Inventors:
HIROTA TETSUYA (JP)
MAEDA TADATOSHI (JP)
MAEDA TADATOSHI (JP)
Application Number:
PCT/JP2022/041072
Publication Date:
May 11, 2023
Filing Date:
November 02, 2022
Export Citation:
Assignee:
TOPPAN INC (JP)
International Classes:
G02B5/22; G02B5/20; G03F7/004; G03F7/027; G03F7/031
Domestic Patent References:
| WO2015151999A1 | 2015-10-08 | |||
| WO2018092600A1 | 2018-05-24 | |||
| WO2017038708A1 | 2017-03-09 |
Foreign References:
| JP2020067552A | 2020-04-30 | |||
| JP2018169600A | 2018-11-01 | |||
| JP2012162684A | 2012-08-30 |
Attorney, Agent or Firm:
ONDA Makoto et al. (JP)
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