Title:
PHOTOSENSITIVE ELEMENT, LAMINATED BODY, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED CIRCUIT BOARD
Document Type and Number:
WIPO Patent Application WO/2017/007001
Kind Code:
A1
Abstract:
The purpose of the invention is to provide a photosensitive element in which a resist pattern having only a small number of micro-defects can be formed. Provided is a photosensitive element provided with a support film, an intermediate layer, and a photosensitive layer in the stated order, wherein the thickness of the support film is 20 μm or greater, and the number of grains in the support film having a diameter of 5 μm or greater is 30 grains/mm2 or less.
Inventors:
KUME MASAKAZU (JP)
ONO HIROSHI (JP)
MATSUMURA RYO (JP)
OHASHI TAKESHI (JP)
YOSHIZAKO KIMIHIRO (JP)
ABE HIROYUKI (JP)
OOTOMO SATOSHI (JP)
ONO HIROSHI (JP)
MATSUMURA RYO (JP)
OHASHI TAKESHI (JP)
YOSHIZAKO KIMIHIRO (JP)
ABE HIROYUKI (JP)
OOTOMO SATOSHI (JP)
Application Number:
PCT/JP2016/070163
Publication Date:
January 12, 2017
Filing Date:
July 07, 2016
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD (JP)
International Classes:
G03F7/004; G03F7/09; G03F7/40; H05K3/06; H05K3/18
Domestic Patent References:
| WO2008093643A1 | 2008-08-07 | |||
| WO2012081680A1 | 2012-06-21 | |||
| WO2007125992A1 | 2007-11-08 |
Foreign References:
| JP2012037872A | 2012-02-23 | |||
| JP2010217399A | 2010-09-30 |
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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