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Title:
PHOTOSENSITIVE MULTILAYER RESIN FILM, PRINTED WIRING BOARD, SEMICONDUCTOR PACKAGE, AND PRINTED WIRING BOARD MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/190811
Kind Code:
A1
Abstract:
The present invention pertains to a photosensitive multilayer resin film comprising a first resin composition layer and a second resin composition layer. The first resin composition layer and the second resin composition layer each contain a compound (A) having an ethylenically unsaturated group, a thermosetting resin (B), a photoinitiator (C), and an inorganic filler (D). The first resin composition layer contains silica as the inorganic filler (D). The second resin composition layer further contains a fluorine-containing resin (E). The silicon atom concentration in the first resin composition layer is higher than the silicon atom concentration in the second resin composition layer.

Inventors:
AYUGASE TOMOHIRO (JP)
KONNO YUKO (JP)
YUKIOKA RYO (JP)
Application Number:
PCT/JP2023/013060
Publication Date:
October 05, 2023
Filing Date:
March 30, 2023
Export Citation:
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Assignee:
RESONAC CORP (JP)
International Classes:
G03F7/095; G03F7/004; G03F7/032; G03F7/033; H05K1/03; H05K3/46
Domestic Patent References:
WO2021253727A12021-12-23
Foreign References:
JP2006285179A2006-10-19
JP2005055655A2005-03-03
JP2013173841A2013-09-05
JP2017088438A2017-05-25
JP2019179200A2019-10-17
JP2022025366A2022-02-10
JP2006285178A2006-10-19
JPH06228504A1994-08-16
JP2014211540A2014-11-13
Attorney, Agent or Firm:
OHTANI PATENT OFFICE (JP)
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