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Title:
PHOTOSENSITIVE ORGANIC PARTICLE
Document Type and Number:
WIPO Patent Application WO/2012/141210
Kind Code:
A1
Abstract:
[Problem] To provide a material whereby a photosensitive composition can be applied to a substrate and dried to form a photosensitive coating, and a pattern can be formed by exposure and development, and to provide a method for patterning the material. [Solution] A photosensitive composition comprising water-soluble organic particles and a solvent, the solvent being a poor solvent with respect to the water-soluble organic particles. The photosensitive composition is preferably configured such that the water-soluble organic particles comprise a polymer containing a unit structure (A) for forming organic particles, a unit structure (B) for forming cross-linkages between particles, and a unit structure (C) for imparting dispersibility, and the composition further includes a photoacid generator. The photosensitive composition may alternatively be configured such that the water-soluble organic particles comprise a polymer containing a unit structure (A) for forming organic particles, a unit structure (B) for forming cross-linkages between particles, a unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group. The pattern formation method comprises the steps of applying the photosensitive composition to a substrate and drying the photosensitive composition to form a photosensitive coating, exposing the coating via a mask, and developing using a developing solution.

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Inventors:
KISHIOKA TAKAHIRO (JP)
UMEZAKI MAKIKO (JP)
KIMURA SHIGEO (JP)
NISHIMAKI HIROKAZU (JP)
OHASHI TOMOYA (JP)
USUI YUKI (JP)
Application Number:
PCT/JP2012/059894
Publication Date:
October 18, 2012
Filing Date:
April 11, 2012
Export Citation:
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Assignee:
NISSAN CHEMICAL IND LTD (JP)
KISHIOKA TAKAHIRO (JP)
UMEZAKI MAKIKO (JP)
KIMURA SHIGEO (JP)
NISHIMAKI HIROKAZU (JP)
OHASHI TOMOYA (JP)
USUI YUKI (JP)
International Classes:
C08F220/54; G03F7/038; C08L101/00; G03F7/004
Foreign References:
JP2005070579A2005-03-17
JP2004109951A2004-04-08
JP2010197996A2010-09-09
JP2004037955A2004-02-05
JPH08120003A1996-05-14
JP2005271576A2005-10-06
JPH083251A1996-01-09
JPH08120003A1996-05-14
Other References:
See also references of EP 2698669A4
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
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Claims:



 
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