Title:
PHOTOSENSITIVE PRINT PLATE DEVELOPING METHOD AND DEVELOPING DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/099797
Kind Code:
A1
Abstract:
Provided are a developing method and a developing device with which, even if a CTP photosensitive print plate is developed in quantity, impurities from non-exposed parts are not prone to stick to or accumulate on a brush. This photosensitive print plate developing method includes a step of supplying an aqueous developer fluid to an exposed photosensitive print plate which is formed from at least a support body, a photosensitive resin, and a thermosensitive mask layer stacked in this order, and removing non-exposed parts with a brush. The method further comprises a step of, prior to the preceding step, causing flowing water to travel over the entire surface of the thermosensitive mask layer of the photosensitive print plate and removing the thermosensitive mask layer in a film state.
Inventors:
MOTOI KEIICHI (JP)
KONO MICHIATSU (JP)
KONO MICHIATSU (JP)
Application Number:
PCT/JP2012/083241
Publication Date:
July 04, 2013
Filing Date:
December 21, 2012
Export Citation:
Assignee:
TOYO BOSEKI (JP)
MOTOI KEIICHI (JP)
KONO MICHIATSU (JP)
MOTOI KEIICHI (JP)
KONO MICHIATSU (JP)
International Classes:
G03F7/38; G03F7/00; G03F7/095; G03F7/30
Domestic Patent References:
| WO2010150844A1 | 2010-12-29 | |||
| WO2010070918A1 | 2010-06-24 |
Foreign References:
| JP2011064796A | 2011-03-31 |
Attorney, Agent or Firm:
KAZAHAYA, Nobuaki et al. (JP)
Nobuaki Kazahaya (JP)
Nobuaki Kazahaya (JP)
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Claims: