Title:
PHOTOSENSITIVE RESIN COMPOSITION AND COLOR FILTER
Document Type and Number:
WIPO Patent Application WO/1989/001186
Kind Code:
A1
Abstract:
A photosensitive resin composition comprising (a) a polymer capable of being dyed with an ionic dye, (b) a photosensitive azide compound, and (c) a compound having two or more acryloyl and/or methacryloyl groups the same molecule, and a color filter prepared from this resin composition are disclosed.
Inventors:
HASHIMOTO MATSUO (JP)
FUTAMURA NOBUYUKI (JP)
YODA SUMIO (JP)
SAIKI YOSHIFUMI (JP)
FUTAMURA NOBUYUKI (JP)
YODA SUMIO (JP)
SAIKI YOSHIFUMI (JP)
Application Number:
PCT/JP1988/000700
Publication Date:
February 09, 1989
Filing Date:
July 14, 1988
Export Citation:
Assignee:
NIPPON KAYAKU KK (JP)
International Classes:
G03F7/012; (IPC1-7): G03C1/71; G02B5/20
Foreign References:
| JPS62138802A | 1987-06-22 | |||
| JPS62127735A | 1987-06-10 | |||
| JPS62115402A | 1987-05-27 | |||
| JPS54161402A | 1979-12-21 | |||
| JPS50108003A | 1975-08-26 | |||
| JPS491225A | 1974-01-08 |
Other References:
See also references of EP 0329791A4
Download PDF:
Previous Patent: PROJECTION SCREEN
Next Patent: PATTERN-FORMING PROCESS UTILIZING RADIATION-INDUCED GRAFT POLYMERIZATION REACTION
Next Patent: PATTERN-FORMING PROCESS UTILIZING RADIATION-INDUCED GRAFT POLYMERIZATION REACTION