Title:
PHOTOSENSITIVE SURFACE TREATMENT AGENT, PATTERN FORMATION SUBSTRATE, LAMINATE, TRANSISTOR, PATTERN FORMATION METHOD, AND TRANSISTOR MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2024/043221
Kind Code:
A1
Abstract:
This photosensitive surface treatment agent contains a compound represented by formula (M1). (In formula (M1), R1 represents a hydrogen atom, a tert-butoxycarbonyl group, or an ester-based protecting group, R2 represents a hydrogen atom or an alkyl group having 1-6 carbon atoms, m represents an integer equal to or greater than 1, and X represents a halogen atom or an alkoxy group.
Inventors:
KAWAKAMI YUSUKE (JP)
YAMAGUCHI KAZUO (JP)
ITOU MICHIKO (JP)
YAMAGUCHI KAZUO (JP)
ITOU MICHIKO (JP)
Application Number:
PCT/JP2023/030083
Publication Date:
February 29, 2024
Filing Date:
August 22, 2023
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03C1/72; C07F7/18; H01L21/288; H01L21/336; H01L29/786
Domestic Patent References:
| WO2021010370A1 | 2021-01-21 | |||
| WO2015129799A1 | 2015-09-03 | |||
| WO2016163525A1 | 2016-10-13 |
Foreign References:
| JP2003321479A | 2003-11-11 | |||
| JP2011225645A | 2011-11-10 |
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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