Title:
PHOTOSENSITIVE SURFACE TREATMENT AGENT, LAMINATE, SUBSTRATE FOR PATTERN FORMATION, TRANSISTOR, PATTERN FORMATION METHOD, AND TRANSISTOR MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2024/043222
Kind Code:
A1
Abstract:
This photosensitive surface treatment agent contains a compound represented by formula (M1). In formula (M1), R1 represents a linear, branched, or cyclic alkyl group having 1-6 carbon atoms, and Y1 represents a single bond or a linear or branched alkylene group having 1-4 carbon atoms. A carbon atom at the end of the alkyl group represented by R1 may be bound to a carbon atom forming the alkylene group represented by Y1, to cause formation of a ring by R1 and Y1. R2 represents a hydrogen atom or an alkyl group having 1-6 carbon atoms, R3 and R4 each independently represent an alkyl group having 1-3 carbon atoms, n0 represents an integer of 0 or more, and X represents a halogen atom or an alkoxy group.
Inventors:
KAWAKAMI YUSUKE (JP)
YAMAGUCHI KAZUO (JP)
ITOU MICHIKO (JP)
YAMAGUCHI KAZUO (JP)
ITOU MICHIKO (JP)
Application Number:
PCT/JP2023/030088
Publication Date:
February 29, 2024
Filing Date:
August 22, 2023
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03C1/72; C07F7/18; H05K1/03
Domestic Patent References:
| WO2021010370A1 | 2021-01-21 | |||
| WO2015129799A1 | 2015-09-03 | |||
| WO2016163525A1 | 2016-10-13 |
Foreign References:
| JP2003321479A | 2003-11-11 | |||
| JP2011225645A | 2011-11-10 |
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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