Title:
PLASMA CONTROL DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/126662
Kind Code:
A1
Abstract:
[Problem] To provide a plasma control device capable of executing processes using stable plasma as well as rapidly executing impedance matching between a power source unit and the plasma. [Solution] A plasma control device 100 comprises a power source unit 1, a resonance generation unit 2, and a voltmeter 5. The resonance generation unit 2 is provided with: an LC circuit in which a coil L1 and a capacitor C1 are connected, and a sensor S2 that detects phase differences between the current flowing through the LC circuit and the applied voltage. The electrostatic capacitance of the capacitor C1 in the LC circuit is greater than the estimated electrostatic capacitance of a plasma P. The power source unit 1 controls the size of the high-frequency power that is supplied such that the voltage measured by the voltmeter 5 approaches a set voltage that serves as a target, and controls the frequency of the high-frequency power that is supplied so as to minimize the phase difference detected by the sensor S2.
Inventors:
HAYAMI TOSHIHIRO (JP)
FUJII RYOSUKE (JP)
FUJII RYOSUKE (JP)
Application Number:
PCT/JP2017/001942
Publication Date:
July 27, 2017
Filing Date:
January 20, 2017
Export Citation:
Assignee:
SPP TECH CO LTD (JP)
International Classes:
H05H1/46; H01L21/3065
Domestic Patent References:
| WO2013099133A1 | 2013-07-04 |
Foreign References:
| JPH04237940A | 1992-08-26 | |||
| JP2013153432A | 2013-08-08 | |||
| JP2013105664A | 2013-05-30 |
Other References:
None
See also references of EP 3337300A4
See also references of EP 3337300A4
Attorney, Agent or Firm:
MAKOTO INTERNATIONAL PATENT ATTORNEYS OFFICE (JP)
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