PLASMA GENERATION DEVICE AND EMISSION SPECTROPHOTOMETER

WIPO Patent Application WO/2013/039189

A1

[Problem] To provide a plasma generation device having a long plasma generation time, and an emission spectrophotometer having an extremely high measurement sensitivity. [Solution] A plasma generation device (1) for generating a plasma (106) in an electroconductive liquid (105) has installed therein a transportation channel, formed from an insulating material, for transporting the electroconductive liquid (105). A narrow portion (103) having a cross-section area considerably smaller than that of the transportation channel is installed in the transportation channel. A means for applying an electric field to the narrow portion (103) is installed so that the electric field passes through the narrow portion (103). The present invention is characterized in that the movement resistance of the electroconductive liquid (105) is greater in one portion of the narrow portion (103) than in other portions.

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TAKAMURA YUZURU (JP)
YAMAMOTO TAMOTSU (JP)

PCT/JP2012/073585

March 21, 2013

September 14, 2012

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JAPAN ADV INST SCIENCE & TECH (JP)
MICRO EMISSION LTD (JP)
TAKAMURA YUZURU (JP)
YAMAMOTO TAMOTSU (JP)

H05H1/24; G01N21/71

WO2005093394A1

2005-10-06

JP2012142150A	2012-07-26
JP2011041914A	2011-03-03
JP2011180045A	2011-09-15

MATSUURA Yasuji (JP)
Koji Matsuura (JP)

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