Title:
PLASMA PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2010/084655
Kind Code:
A1
Abstract:
A microwave plasma processing apparatus (10) has: a processing container (100) wherein a gas is excited by microwaves and a substrate (G) is plasma-processed; a microwave source (900) which outputs microwaves; a transmission line which transmits the microwaves outputted from the microwave source (900); a plurality of dielectric boards (305), which are arranged on the inner surface of the processing container (100) and discharge the microwaves in the processing container (100); a plurality of first coaxial tubes (610) which are adjacent to the dielectric boards (305) and transmit the microwaves to the dielectric boards (305); and a coaxial tube distributor (600) which transmits the microwaves transmitted through the transmission line, by distributing the microwaves to the first coaxial tubes (610). The coaxial tube distributor (600) includes a second coaxial tube (620), which has an input section (In), and branched structures (B1, B2) which are connected to the first coaxial tubes (610) and have different configurations.
Inventors:
HIRAYAMA MASAKI (JP)
OHMI TADAHIRO (JP)
OHMI TADAHIRO (JP)
Application Number:
PCT/JP2009/068748
Publication Date:
July 29, 2010
Filing Date:
November 02, 2009
Export Citation:
Assignee:
UNIV TOHOKU (JP)
TOKYO ELECTRON LTD (JP)
HIRAYAMA MASAKI (JP)
OHMI TADAHIRO (JP)
TOKYO ELECTRON LTD (JP)
HIRAYAMA MASAKI (JP)
OHMI TADAHIRO (JP)
International Classes:
H05H1/46; H01L21/205; H01L21/3065
Domestic Patent References:
| WO2008153064A1 | 2008-12-18 |
Foreign References:
| JP2001192840A | 2001-07-17 | |||
| JP2005310478A | 2005-11-04 | |||
| JP2005116362A | 2005-04-28 |
Attorney, Agent or Firm:
KAMEYA, Yoshiaki et al. (JP)
Yoshiaki Kameya (JP)
Yoshiaki Kameya (JP)
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