Title:
PLASMA PROCESSING DEVICE AND PLASMA GENERATING METHOD
Document Type and Number:
WIPO Patent Application WO/2003/077302
Kind Code:
A1
Abstract:
A plasma processing device, wherein the lengths L of slots (26) are monotonously increased from the center part (A) of an antenna surface (28) in an outer radial direction and maximized at a first intermediate part (C) and the maximum lengths are maintained from the first intermediate part (C) to a peripheral edge part (B) to increase a radiation power by a slot antenna as compared with a case when the lengths L are monotonously increased from the center part of the antenna surface (28) to the peripheral edge part thereof, whereby a reflected power from the slot antenna is reduced since the power remaining in the slot antenna is reduced without being radiated from the slot antenna.
Inventors:
YASAKA YASUYOSHI (JP)
TAKAHASHI MASAHARU (JP)
ANDO MAKOTO (JP)
ISHII NOBUO (JP)
TAKAHASHI MASAHARU (JP)
ANDO MAKOTO (JP)
ISHII NOBUO (JP)
Application Number:
PCT/JP2003/002925
Publication Date:
September 18, 2003
Filing Date:
March 12, 2003
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
YASAKA YASUYOSHI (JP)
TAKAHASHI MASAHARU (JP)
ANDO MAKOTO (JP)
ISHII NOBUO (JP)
YASAKA YASUYOSHI (JP)
TAKAHASHI MASAHARU (JP)
ANDO MAKOTO (JP)
ISHII NOBUO (JP)
International Classes:
H05H1/46; H01J37/32; H01L21/3065; (IPC1-7): H01L21/3065
Foreign References:
| JP2002050615A | 2002-02-15 | |||
| JP2000223298A | 2000-08-11 | |||
| US5698036A | 1997-12-16 |
Attorney, Agent or Firm:
Yamakawa, Masaki c/o Yamakawa International Patent Office (8th FIoor Shuwa-Tameike Building, 4-2,
Nagatacho 2-chom, Chiyoda-ku Tokyo, JP)
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