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Title:
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2016/181974
Kind Code:
A1
Abstract:
Provided is a plasma processing device comprising the following: a processing container; a carrier wave group generation unit that generates a carrier wave group comprising a plurality of carrier waves each having a mutually different frequency, such frequency belonging to a predetermined frequency band with a predetermined center frequency as the center; and a plasma generation unit that generates plasma inside the processing container by using the carrier wave group.

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Inventors:
KUBOTA SHINJI (JP)
Application Number:
PCT/JP2016/063926
Publication Date:
November 17, 2016
Filing Date:
May 10, 2016
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H05H1/46; C23C16/511; H01L21/3065; H01L21/31
Foreign References:
JP2007035597A2007-02-08
JP2011190479A2011-09-29
JP2000022661A2000-01-21
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
Patent business corporation Sakai international patent firm (JP)
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