Title:
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/156906
Kind Code:
A1
Abstract:
The plasma processing device is configured to comprise a plasma processing chamber provided with an electrode for mounting a substrate to be treated thereon in the interior, a power supply unit for supplying power for plasma generation to the plasma processing chamber, and a control unit for controlling power to be supplied to the plasma processing chamber from the power supply unit, wherein the control unit is configured to execute, in a state where the substrate to be treated is not mounted on the electrode in the interior of the plasma processing chamber, heat-retention electrical discharge of controlling the power supply unit under a first condition, thereby generating first plasma in the interior of the plasma processing chamber, and heating the inner wall surface of the plasma processing chamber to a first temperature, and rapid temperature regulation electrical discharge of thereafter controlling the power supply unit under a second condition, thereby generating second plasma in the interior of the plasma processing chamber, and heating the inner wall surface of the plasma processing chamber to a second temperature higher than the first temperature, and to execute, in a state where the substrate to be treated is mounted on the electrode, product processing of controlling the power supply unit under a third condition, thereby generating third plasma in the interior of the plasma processing chamber, and processing the substrate to be treated.
Inventors:
TAMARI NANAKO (JP)
HIROTA KOSA (JP)
SUMIYA MASAHIRO (JP)
NAGATANI MASAHIRO (JP)
HIROTA KOSA (JP)
SUMIYA MASAHIRO (JP)
NAGATANI MASAHIRO (JP)
Application Number:
PCT/JP2020/003894
Publication Date:
August 12, 2021
Filing Date:
February 03, 2020
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01L21/3065
Foreign References:
| JP2010219198A | 2010-09-30 | |||
| JPH088232A | 1996-01-12 | |||
| JPH10130872A | 1998-05-19 | |||
| JPH09172003A | 1997-06-30 | |||
| JP2016103496A | 2016-06-02 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
Download PDF:
Previous Patent: HEAT STORAGE WATER HEATER
Next Patent: FLOW RATE INFORMATION OUTPUT DEVICE, CONTROL METHOD, AND PROGRAM
Next Patent: FLOW RATE INFORMATION OUTPUT DEVICE, CONTROL METHOD, AND PROGRAM