Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2014/007066
Kind Code:
A1
Abstract:
Provided is a plasma processing device that is easily assembled, is easily maintained, and has uniform gas flow. In this plasma processing device a gas supply means is arranged symmetrical to the center axis (11a) of a processing chamber (11), and an antenna and a support stand are arranged coaxial to the central axis (11a). In addition, an exhaust port (21) is arranged on the bottom surface (17) such that with respect to the central axis (11a), the center (21a) of the exhaust port (21) is offset in the opening direction (OD) of a valve body (22a). A connecting port (24) is arranged on a portion of the bottom surface (17) where the exhaust port (21) does not exist, such that with respect to the central axis (11a), the center (24a) of the connecting port (24) is offset in the closing direction (CD) of the valve body (22a). A middle conduit (31b) between the upper conduit (31a) and the lower conduit (31c) of a power introduction conduit (31) intersects the central axis (11a) and is arranged along the direction of a center line (11b), which is the opening/closing direction of the valve body (22a).
Inventors:
MATSUDA RYUICHI (JP)
YOSHIDA KAZUTO (JP)
YOSHIDA KAZUTO (JP)
Application Number:
PCT/JP2013/066918
Publication Date:
January 09, 2014
Filing Date:
June 20, 2013
Export Citation:
Assignee:
MITSUBISHI HEAVY IND LTD (JP)
International Classes:
C23C16/50; H01L21/3065; H01L21/31; H05H1/46
Foreign References:
| JP2011166101A | 2011-08-25 | |||
| JP2007242668A | 2007-09-20 |
Attorney, Agent or Firm:
MITSUISHI, Toshiro et al. (JP)
Toshiro Mitsuishi (JP)
Toshiro Mitsuishi (JP)
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