Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/126365
Kind Code:
A1
Abstract:
Provided is a plasma processing device comprising: a processing container; a high-frequency power source supplying a high-frequency power to the processing container, and causing plasma to form inside the processing container; a predetermined connection portion provided between the high-frequency power source and the processing container; and a load variation stabilization circuit connected at the connection portion and parallel to the processing container,and suppressing a variation in the load impedance when the downstream side is seen from the connection portion.
Inventors:
YAMAZAWA YOHEI (JP)
FURUYA ATSUKI (JP)
FURUYA ATSUKI (JP)
Application Number:
PCT/JP2017/000469
Publication Date:
July 27, 2017
Filing Date:
January 10, 2017
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H05H1/46; C23C16/509; H01L21/31
Foreign References:
| JP2013251129A | 2013-12-12 | |||
| JP2006073723A | 2006-03-16 | |||
| JP2005281718A | 2005-10-13 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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