Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/163582
Kind Code:
A1
Abstract:
This plasma processing device is provided with: a plasma processing chamber; a substrate supporting portion disposed inside the plasma processing chamber; an annular member which is disposed on the substrate supporting portion in such a way as to surround a substrate on the substrate supporting portion, and which has a lower surface including a recessed portion that has an inclined surface inclined with respect to the vertical direction; a raising and lowering member which is disposed below the annular member and which is capable of coming into contact with the recessed portion of the annular member; a drive portion configured to move the raising and lowering member in the vertical direction relative to the substrate supporting portion; a first detecting portion configured to detect a first parameter relating to a load on the drive portion; a second detecting portion configured to detect a second parameter relating to an amount of movement of the raising and lowering member; and a control portion. The control portion is configured to: detect contact between the raising and lowering member and the recessed portion of the annular member on the basis of the first parameter; determine an elevation amount, from a reference height, of the raising and lowering member until contact is made with the recessed portion of the annular member, on the basis of the second parameter; and determine whether the annular member is positionally displaced in the horizontal direction with respect to the substrate supporting portion on the basis of the elevation amount and a threshold.
Inventors:
SASAKI NOBUTAKA (JP)
SATO TETSUJI (JP)
MATSUURA SHIN (JP)
SATO TETSUJI (JP)
MATSUURA SHIN (JP)
Application Number:
PCT/JP2022/002441
Publication Date:
August 04, 2022
Filing Date:
January 24, 2022
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H05H1/46; C23C16/458; C23C16/50; H01L21/205; H01L21/3065; H01L21/683
Foreign References:
| JP2020115499A | 2020-07-30 | |||
| JP2016146472A | 2016-08-12 | |||
| JP2005340693A | 2005-12-08 | |||
| JP2020057712A | 2020-04-09 | |||
| JP2020161827A | 2020-10-01 |
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (JP)
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