Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/248781
Kind Code:
A1
Abstract:
Provided is a plasma processing device having: a processing container that has a plasma generation space formed in the interior thereof; an electrode to which electromagnetic waves for generating plasma are applied; a waveguide that is provided along the periphery of the electrode; and an electromagnetic wave emission part that is formed from a dielectric body and emits the electromagnetic waves into the plasma generation space, wherein the plasma processing device also has a multipactor discharge part that is a gap formed between the electrode and the electromagnetic wave emission part and faces the plasma generation space.
Inventors:
IKEDA TARO (JP)
KITAHARA TOSHIFUMI (JP)
KITAHARA TOSHIFUMI (JP)
Application Number:
PCT/JP2023/020960
Publication Date:
December 28, 2023
Filing Date:
June 06, 2023
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H05H1/46; C23C16/511
Foreign References:
| JP2021096934A | 2021-06-24 | |||
| US20210280402A1 | 2021-09-09 | |||
| JP2003115400A | 2003-04-18 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
Download PDF: