Title:
VAPOR PHASE GROWTH APPARATUS
Document Type and Number:
WIPO Patent Application WO/2023/248780
Kind Code:
A1
Abstract:
A vapor phase growth apparatus according to the present embodiment comprises: a chamber that has a head part at an upper section, a process being performed on a wafer in the interior of the chamber; a process gas supply unit that is provided to the head part and supplies a process gas into the chamber; a translucent member that includes a recess provided in the upper surface of the head part and a portion surrounded by the recess, the translucent member being such that a first gap between a side surface of the portion and a side surface of the recess is larger than a second gap between the bottom surface of the portion and the bottom surface of the recess; a gas introduction part that is provided to the head part and introduces a gas between the side surface of the recess and the side surface of the portion; and a plurality of gas supply units that are provided to the head part, allow communication between the recess and the chamber, and supply a gas into the chamber.
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Inventors:
DAIGO YOSHIAKI (JP)
SUZUKI KUNIHIKO (JP)
SUZUKI KUNIHIKO (JP)
Application Number:
PCT/JP2023/020958
Publication Date:
December 28, 2023
Filing Date:
June 06, 2023
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
H01L21/31; C23C16/52
Foreign References:
| JP2008053359A | 2008-03-06 | |||
| JP2010225743A | 2010-10-07 | |||
| JP2006225705A | 2006-08-31 | |||
| JP2022521232A | 2022-04-06 | |||
| JP2003332318A | 2003-11-21 |
Attorney, Agent or Firm:
IKEGAMI, Tetsuma et al. (JP)
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